| 报告题目：A Thin Film Approach to Engineering Functionality into Oxides 报 告 人：Prof. Darrell G. Schlom 时 间：2009年6月12日（星期五），10：00-11：00 地 点：曹光彪大楼326 主 持 人：浙江大学材料系 叶志镇 教授 联 系 人：潘新花 电话：134 8618 0477 欢迎广大师生参加！ |  |
| Darrell G. Schlom教授简介 EDUCATION Stanford University Materials Science and Engineering Ph.D., 1990 AREA OF EXPERTISE Research involving heteroepitaxial growth and characterization of oxide thin films, especially ferroelectric and multiferroic oxides, oxides on semiconductors for increased functionality (e.g., spintronics), or as potential replacements for SiO2 as the gate dielectric in MOSFETs. EXPERIENCE Professor, Cornell University (Materials Science and Engineering, 2008 - present) Distinguished Professor, Penn State University (Materials Science and Engineering, 2007 - 2008) Professor, Penn State University (Materials Science and Engineering, 2002 - 2007) AWARDS AND FELLOWSHIPS MRS Medal (2008) Penn State Faculty Scholar Medal in Engineering (2006) Semiconductor Research Corporation (SRC) Inventor Recognition Award (2004) PUBLICATIONS AND PATENTS (h index = 44, total citations > 8,000) Over 300 Co-authored Publications (including 2 encyclopedia articles and 4 book chapters) 8 Patents Granted (2 more pending)
| |
